Other Equipment
Spectroscopic ellipsometer WOOLLAM M-2000 DI
The spectroscopic ellipsometer is used to measure flat, non-scattering surfaces. It can be used to determine the refractive index, the absorption coefficient and the thickness of thin layers (usually 2 nm to 10 μm).
Measurements of:
- Optical constants (n, k)
- Layer thicknesses (usually 2 nm to 10 μm)
Program Division:
Optical Materials
Dr. Peter W. de Oliveira
3D profilometer ZEISS Surfcom 1500 SD3
The 3D profilometer Surfcom 1500 SD3 by ZEISS can be used to carry out quick, simple and precise surface measurement objects. Inter alia, the equipment provides very high accuracies and reproducibility and very high measurement speeds (additional feed unit with patented linear motor technology and glass scale in the X-axis). ACTEE software can be used for flexible, comprehensive measurements that conform to standards; and also for evaluation and professional documentation.A number of further practical and specific applications are available. Complete CNC programs can be created quickly and easily via Teach-In, for example for multiple measurements on the same work piece during the same clamping.
Measurement of:
- Roughness according to DIN, EN, ISO (various standards)
- 2D surface profile (x and z)
- 3D surface topography (x, y, z) (layer thickness)
Program Division:
Optical Materials
Dr. Peter W. de Oliveira
UV-Vis-NIR spectrophotometer Cary 5000
The Cary 5000 is a high-performance UV-Vis-NIR two beam spectrophotometer for measuring the absorption between 175 and 3000 nm (even of strongly scattering substances), measuring transmission, reflection or transflection, liquid samples, powders and pastes, determining the concentration, spectral kinetics and colour metrics.
Measurement of:
- Spectroscopic examinations of transmission and reflection
Program Division:
Optical Materials
Dr. Peter W. de Oliveira
White-light interferometer ZYGO
The white-light interferometer can be used as a measuring instrument for representing the surface topography (3D) of reflecting samples. It is also possible to measure layer thicknesses and surfaces with steps or rough surfaces. On flat surfaces, it is possible to achieve (longitudinal) measurement accuracies of the order of a few nanometers.
Program Division:
Optical Materials
Dr. Peter W. de Oliveira
Hazemeter BYK-Gardner HazeGard plus
The hazemeter affords the possibility of measuring haze, clarity and transmittance according to ASTM D 1003. Storage and data transfer to a PC allows the professional documentation of the measurement results.
Program Division:
Optical Materials
Dr. Peter W. de Oliveira
Hysitron TriboIndenter TI 950
Nanoindenter for determining mechanical properties of planar samples made of metal, ceramics, polymers, composites or biological materials.The Performech controller allows both force and path controlled measurements. Here, various force sensors can be used to apply a broad range of forces, with resolutions of 0.1 μN and up to maximum forces of 2 N: a standard transducer, NanoDMA, Rapidprobe and 3D Omniprobe are available for selection. If the XZ-500 sample stage is used, deflections of up to 500 μm can be achieved. A large tip selection permits the examination of various material systems, partly in liquids as well: Berkovich, cube-corner, flat punch and spherical systems. The sample position to be examined can be approached with an accuracy of 0.5 μm. To this end, the nanoindenter is equipped with an epi-illumination microscope with 20 times and 50 times magnification. Moreover, a heating stage allows examinations up to a temperature of 400°C. An active and passive vibration control and an acoustic housing shield the sample from environmental influences.
The following analysis options are offered:
- Determining Young’s modulus and the hardness from indentation trials
- Dynamic measuring mode nanoDMA for examining viscoelastic properties
- Determining frictional forces, penetration-depth profiles and abrasion by means of scratch trials
- Imaging the impressions or scratches with the aid of indenter tips or an AFM
Program Division:
Nanotribology
Prof. Dr. Roland Bennewitz

